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Processing of C{sub 3}H{sub 7}OH, C{sub 2}HCl{sub 3} and CCl{sub 4} in flue gases using silent discharge plasmas, enhanced by (V)UV at 172 nm and 253.7 nm

机译：使用无声放电等离子体处理烟气中的C {sub 3} H {sub 7} OH，C {sub 2} HCl {sub 3}和CCl {sub 4}，通过（V）UV在172 nm和253.7 nm处增强

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Falkenstein, Z.; Coogan, J.J.;
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年度 1996
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1. Anatoxin-a degradation by Advanced Oxidation Processes: Vacuum-UV at 172 nm, photolysis using medium pressure UV and UV/H_2O_2 [J] . Atefeh Afzal, Thomas Oppenlaender, James R. Bolton, Water Research . 2010,第1期

机译：通过先进的氧化工艺降解Anatoxin-a：在172 nm真空下进行UV-紫外线，使用中压UV和UV / H_2O_2进行光解
2. Degradation of N-nitrosamines and 1,4-dioxane using vacuum ultraviolet irradiation (UV_(254+85 nm) or UV_(172 nm)) [J] . Fujioka Takahiro, Kodamatani Hitoshi, Hai Duc Minh Tran, Chemosphere . 2021,第Sepa期

机译：使用真空紫外线照射（UV_（254 + 85nm）或UV_（172nm））降解N-硝基胺和1,4-二恶烷
3. Degradation of a model naphthenic acid, cyclohexanoic acid, by vacuum UV (172 nm) and UV (254 nm)/H_2O_2 [J] . Drzewicz P., Afzal A., El-Din M.G., The journal of physical chemistry, A. Molecules, spectroscopy, kinetics, environment, & general theory . 2010,第45期

机译：真空紫外光（172 nm）和紫外光（254 nm）/ H_2O_2降解模型环烷酸环己酸
4. The effect of AC applied voltage phase differences on the NO/sub x/ reduction from the combustion flue gases by superimposed surface and silent discharge plasma reactors [C] . Urashima, K., Chang, Industry Applications Conference, 1995. Thirtieth IAS Annual Meeting, IAS '95., Conference Record of the 1995 IEEE . 1995

机译：交流施加的电压相差对叠加表面和无声放电等离子体反应器燃烧烟道气中NO / sub x /还原的影响
5. I. Environmental abatement of air pollutants and greenhouse gases by photocatalytic oxidation and discharge plasmas. II. Preparation and characterization of binary mesoporous oxides. [D] . Huang, Aimin. 2001

机译：I.通过光催化氧化和放电等离子体消除空气污染物和温室气体的环境。二。二元介孔氧化物的制备和表征。
6. Degradation of Iodinated Contrast Media in Aquatic Environment by Means of UV UV/TiO2 Process and by Activated Sludge [O] . Ewa Borowska, Ewa Felis, Sebastian Żabczyński -1

机译：通过UVUV / TiO2工艺和活性污泥降解水环境中碘化造影剂
7. Dependence of 253.7 nm Emission Efficiency on the Discharge Tube Radius in Ar-Hg Mixture Gases [O] . Yoshio Watanabe, Manabu Higashii 1995

机译：AR-HG混合气体排出管半径对253.7nm发光效率的依赖性
8. Processing of C3H7OH, C2HCl3 and CCl4 in flue gases using silent discharge plasmas, enhanced by (V)UV at 172 nm and 253.7 nm [R] . Falkenstein, Z., Coogan, J. J. 1996

机译：使用无声放电等离子体处理烟道气中的C3H7OH，C2HCl3和CCl4，通过（V）UV在172 nm和253.7 nm处增强

Processing of C{sub 3}H{sub 7}OH, C{sub 2}HCl{sub 3} and CCl{sub 4} in flue gases using silent discharge plasmas, enhanced by (V)UV at 172 nm and 253.7 nm

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